发明申请
US20080049226A1 APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
有权
用于使用散射检测来检测重叠错误的装置和方法
- 专利标题： APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- 专利标题（中）： 用于使用散射检测来检测重叠错误的装置和方法
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申请号： US11926603申请日： 2007-10-29
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公开(公告)号： US20080049226A1公开(公告)日： 2008-02-28
- 发明人: Walter Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant
- 申请人： Walter Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant
- 申请人地址： US CA Milpitas 95035
- 专利权人： KLA-TENCOR TECHNOLOGIES CORPORATION
- 当前专利权人： KLA-TENCOR TECHNOLOGIES CORPORATION
- 当前专利权人地址： US CA Milpitas 95035
- 主分类号： G01B11/00
- IPC分类号： G01B11/00
摘要：
Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.
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