发明申请
- 专利标题： Semiconductor substrate cleaning apparatus
- 专利标题（中）： 半导体基板清洗装置
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申请号： US11891339申请日： 2007-08-09
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公开(公告)号： US20080053486A1公开(公告)日： 2008-03-06
- 发明人: Jianshe Tang , Wei Lu , Zhiyong Li , Bo Xie , Alexander Ko
- 申请人： Jianshe Tang , Wei Lu , Zhiyong Li , Bo Xie , Alexander Ko
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： B08B3/02
- IPC分类号： B08B3/02
摘要：
A semiconductor substrate processing apparatus and a method for processing semiconductor substrates are provided. The semiconductor substrate processing apparatus may include a liquid container where a semiconductor substrate may be immersed in a semiconductor processing liquid. The semiconductor substrate may then be removed from the semiconductor processing liquid while vapor is directed at a surface of the semiconductor substrate where the semiconductor substrate contacts a surface of the processing liquid.
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