发明申请
- 专利标题: Pattern Inspection Method And Apparatus
- 专利标题(中): 图案检验方法及装置
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申请号: US11931856申请日: 2007-10-31
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公开(公告)号: US20080056559A1公开(公告)日: 2008-03-06
- 发明人: Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
- 申请人: Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
- 优先权: JP2000-347443 20001109
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
An apparatus for processing a defect candidate image, including: a scanning electron microscope for taking an enlarged image of a specimen by irradiating and scanning a converged electron beam onto the specimen and detecting charged particles emanated from the specimen by the irradiation; an image processor for processing the image taken by the scanning electron microscope to detect defect candidates on the specimen and classify the detected defect candidates into one of plural classes; a memory for storing output from the image processor including images of the detected defect candidates; and a display unit which displays information stored in the memory and an indicator, wherein the display unit displays a distribution of the detected and classified defect candidates in a map format by distinguishing by the classified class, and the display unit also displays an image of a defect candidate stored in the memory together with the map which is indicated on the map by the indicator.
公开/授权文献
- US07957579B2 Pattern inspection method and apparatus 公开/授权日:2011-06-07
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