发明申请
- 专利标题: MANUFACTURING METHOD OF PHOTOELECTRIC CONVERSION DEVICE
- 专利标题(中): 光电转换装置的制造方法
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申请号: US11840583申请日: 2007-08-17
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公开(公告)号: US20080057615A1公开(公告)日: 2008-03-06
- 发明人: Takashi Okagawa , Hiroaki Naruse , Hiroshi Yuzurihara , Shigeru Nishimura , Takeshi Aoki , Yuya Fujino
- 申请人: Takashi Okagawa , Hiroaki Naruse , Hiroshi Yuzurihara , Shigeru Nishimura , Takeshi Aoki , Yuya Fujino
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-235936 20060831; JP2006-236760 20060831; JP2007-189447 20070720
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A noise generated by a constitution of widening an incident aperture of light of a photoelectric conversion element is reduced. In a manufacturing method of a photoelectric conversion device, first electroconductor arranged in a first hole arranged in the first interlayer insulation layer electrically connects a first semiconductor region to a gate electrode of an amplifying MOS transistor not through wirings included in a wiring layer. Moreover, a second electroconductor electrically connects a second semiconductor region different from the first semiconductor region to a wiring. In a constitution of that second electroconductor, a third electroconductor arranged in a second hole arranged in the first interlayer insulation layer and a fourth electroconductor arranged in a third hole arranged in the second interlayer insulation layer are stacked and electrically connected to each other. And the step of forming the first electroconductor, and the step of forming the third electroconductor are performed simultaneously.
公开/授权文献
- US07749788B2 Manufacturing method of photoelectric conversion device 公开/授权日:2010-07-06
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