发明申请
- 专利标题: Lithographic apparatus, beam delivery systems, prisms and device manufacturing method
- 专利标题(中): 光刻设备,光束传输系统,棱镜和器件制造方法
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申请号: US11443451申请日: 2006-05-31
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公开(公告)号: US20080067424A1公开(公告)日: 2008-03-20
- 发明人: Hako Botma , Ewoud Vreugdenhil , Joe Sakai
- 申请人: Hako Botma , Ewoud Vreugdenhil , Joe Sakai
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.
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