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1.发明授权Lithographic apparatus, beam delivery systems, prisms and device manufacturing method 失效光刻设备，光束传输系统，棱镜和器件制造方法公开(公告)号：US07507976B2
公开(公告)日：2009-03-24
申请号：US11443451
申请日：2006-05-31
申请人： Hako Botma , Ewoud Vreugdenhil , Joe Sakai
发明人： Hako Botma , Ewoud Vreugdenhil , Joe Sakai
IPC分类号： G02B5/04
CPC分类号： G03F7/70941 , G02B5/04 , G02B5/3066 , G03F7/70058 , G03F7/70566
摘要： A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.
摘要翻译： 射束引导元件，被配置为接收在第一方向上传播的预定波长的基本上准直的输入光束并且沿第二方向输出基本准直的输出光束，包括由透明材料形成并具有输入和输出面的棱镜，其中内部 输入面和输出面之间的角度使得当输入光束以布鲁斯特角度入射在输入面上时，其以布鲁斯特角内部入射在输出面上。 光束引导元件在光刻中是有用的，例如在光束传送系统中。
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2.发明申请Lithographic apparatus, beam delivery systems, prisms and device manufacturing method 失效光刻设备，光束传输系统，棱镜和器件制造方法公开(公告)号：US20080067424A1
公开(公告)日：2008-03-20
申请号：US11443451
申请日：2006-05-31
申请人： Hako Botma , Ewoud Vreugdenhil , Joe Sakai
发明人： Hako Botma , Ewoud Vreugdenhil , Joe Sakai
IPC分类号： G03F7/20
CPC分类号： G03F7/70941 , G02B5/04 , G02B5/3066 , G03F7/70058 , G03F7/70566
摘要： A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.
摘要翻译： 射束引导元件，被配置为接收在第一方向上传播的预定波长的基本上准直的输入光束并且沿第二方向输出基本准直的输出光束，包括由透明材料形成并具有输入和输出面的棱镜，其中内部 输入面和输出面之间的角度使得当输入光束以布鲁斯特角度入射在输入面上时，其以布鲁斯特角内部入射在输出面上。 光束引导元件在光刻中是有用的，例如在光束传送系统中。
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公开(公告)号：US07405811B2
公开(公告)日：2008-07-29
申请号：US11135637
申请日：2005-05-24
CPC分类号： G03F7/70775
摘要： A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, and a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
摘要翻译： 光刻设备包括用于保持衬底的衬底台，参考结构和测量系统，以测量衬底台相对于参考结构的位置。 测量系统包括测量衬底台相对于中间结构的位置的第一测量系统和用于测量中间结构相对于参考结构的位置的第二测量系统。 中间结构可以连接或连接到驱动机构以驱动衬底台。 衬底台和中间结构之间的距离以及中间结构与参考结构之间的距离可能较小，这导致高度准确的位置测量。
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公开(公告)号：US07349069B2
公开(公告)日：2008-03-25
申请号：US11109860
申请日：2005-04-20
CPC分类号： G03F7/70775
摘要： A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, resp. a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
摘要翻译： 光刻设备包括用于保持衬底的衬底台，参考结构和测量系统，以测量衬底台相对于参考结构的位置。 测量系统包括测量衬底台相对于中间结构的位置的第一测量系统和用于测量中间结构相对于参考结构的位置的第二测量系统。 中间结构可以连接或连接到驱动机构以驱动衬底台。 衬底台与中间结构之间的距离， 中间结构和参考结构之间的距离可能较小，这导致高度精确的位置测量。
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公开(公告)号：US20120276761A1
公开(公告)日：2012-11-01
申请号：US13097123
申请日：2011-04-29
CPC分类号： H01R13/6658 , H01R12/724 , H01R13/506 , H01R13/5202
摘要： A header connector assembly and a process of fabricating a header connector assembly is disclosed. The header connector assembly includes a header subassembly and a module. The header subassembly includes an outer housing and an inner housing, the inner housing having contacts and a circuit board, wherein the circuit board is attached to the header subassembly.
摘要翻译： 公开了插头连接器组件和制造插头连接器组件的工艺。 插头连接器组件包括插头子组件和模块。 所述头部组件包括外部壳体和内部壳体，所述内部壳体具有接触件和电路板，其中所述电路板连接到所述头部组件。
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公开(公告)号：US20060238733A1
公开(公告)日：2006-10-26
申请号：US11135637
申请日：2005-05-24
申请人： Marcel Beems , Joe Sakai
发明人： Marcel Beems , Joe Sakai
IPC分类号： G03B27/52
CPC分类号： G03F7/70775
摘要： A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, and a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
摘要翻译： 光刻设备包括用于保持衬底的衬底台，参考结构和测量系统，以测量衬底台相对于参考结构的位置。 测量系统包括测量衬底台相对于中间结构的位置的第一测量系统和用于测量中间结构相对于参考结构的位置的第二测量系统。 中间结构可以连接或连接到驱动机构以驱动衬底台。 衬底台和中间结构之间的距离以及中间结构与参考结构之间的距离可能较小，这导致高度准确的位置测量。
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公开(公告)号：US20060238731A1
公开(公告)日：2006-10-26
申请号：US11109860
申请日：2005-04-20
申请人： Marcel Beems , Joe Sakai
发明人： Marcel Beems , Joe Sakai
IPC分类号： G03B27/52
CPC分类号： G03F7/70775
摘要： A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, resp. a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
摘要翻译： 光刻设备包括用于保持衬底的衬底台，参考结构和测量系统，以测量衬底台相对于参考结构的位置。 测量系统包括测量衬底台相对于中间结构的位置的第一测量系统和用于测量中间结构相对于参考结构的位置的第二测量系统。 中间结构可以连接或连接到驱动机构以驱动衬底台。 衬底台与中间结构之间的距离， 中间结构和参考结构之间的距离可能较小，这导致高度精确的位置测量。
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公开(公告)号：US08523581B2
公开(公告)日：2013-09-03
申请号：US13097123
申请日：2011-04-29
IPC分类号： H01R12/00
CPC分类号： H01R13/6658 , H01R12/724 , H01R13/506 , H01R13/5202
摘要： A header connector assembly and a process of fabricating a header connector assembly is disclosed. The header connector assembly includes a header subassembly and a module. The header subassembly includes an outer housing and an inner housing, the inner housing having contacts and a circuit board, wherein the circuit board is attached to the header subassembly.
摘要翻译： 公开了插头连接器组件和制造插头连接器组件的工艺。 插头连接器组件包括插头子组件和模块。 所述头部组件包括外部壳体和内部壳体，所述内部壳体具有接触件和电路板，其中所述电路板连接到所述头部组件。
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