发明申请
- 专利标题： PHASE SHIFTING PHOTOMASK AND A METHOD OF FABRICATING THEREOF
- 专利标题（中）： 相移相机及其制作方法
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申请号： US11838418申请日： 2007-08-14
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公开(公告)号： US20080070130A1公开(公告)日： 2008-03-20
- 发明人: SCOTT ALAN ANDERSON , Xiaoyi Chen , Michael N. Grimbergen , Ajay Kumar
- 申请人： SCOTT ALAN ANDERSON , Xiaoyi Chen , Michael N. Grimbergen , Ajay Kumar
- 主分类号： G03F9/00
- IPC分类号： G03F9/00
摘要：
A phase shifting photomask comprising a patterned film stack formed on a transparent substrate and a method of fabricating the photomask are disclosed. In one embodiment, the film stack includes a first layer having a pre-determined value of transparency to light of an illumination source of a lithographic system and a second layer that is substantially transparent to the light and facilitates in the light a pre-determined phase shift.
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