发明申请
- 专利标题: PHOTOELECTRIC CONVERSION DEVICE, AND PROCESS FOR ITS FABRICATION
- 专利标题(中): 光电转换装置及其制造方法
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申请号: US11941614申请日: 2007-11-16
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公开(公告)号: US20080070341A1公开(公告)日: 2008-03-20
- 发明人: Hiroshi Yuzurihara
- 申请人: Hiroshi Yuzurihara
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 优先权: JP11-223078 19990805; JP2000-232108 20000731
- 主分类号: H01L31/18
- IPC分类号: H01L31/18
摘要:
In a photoelectric conversion device comprising a photoelectric-conversion section and a peripheral circuit section where signals sent from the photoelectric-conversion section are processed, the both sections being provided on the same semiconductor substrate, a semiconductor compound layer of a high-melting point metal is provided on the source and drain and a gate electrode of an MOS transistor that forms the peripheral circuit section, and the top surface of a semiconductor diffusion layer that serves as a light-receiving part of the photoelectric conversion section is in contact with an insulating layer.
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