发明申请
US20080070341A1 PHOTOELECTRIC CONVERSION DEVICE, AND PROCESS FOR ITS FABRICATION 有权
光电转换装置及其制造方法

  • 专利标题: PHOTOELECTRIC CONVERSION DEVICE, AND PROCESS FOR ITS FABRICATION
  • 专利标题(中): 光电转换装置及其制造方法
  • 申请号: US11941614
    申请日: 2007-11-16
  • 公开(公告)号: US20080070341A1
    公开(公告)日: 2008-03-20
  • 发明人: Hiroshi Yuzurihara
  • 申请人: Hiroshi Yuzurihara
  • 申请人地址: JP Tokyo
  • 专利权人: Canon Kabushiki Kaisha
  • 当前专利权人: Canon Kabushiki Kaisha
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP11-223078 19990805; JP2000-232108 20000731
  • 主分类号: H01L31/18
  • IPC分类号: H01L31/18
PHOTOELECTRIC CONVERSION DEVICE, AND PROCESS FOR ITS FABRICATION
摘要:
In a photoelectric conversion device comprising a photoelectric-conversion section and a peripheral circuit section where signals sent from the photoelectric-conversion section are processed, the both sections being provided on the same semiconductor substrate, a semiconductor compound layer of a high-melting point metal is provided on the source and drain and a gate electrode of an MOS transistor that forms the peripheral circuit section, and the top surface of a semiconductor diffusion layer that serves as a light-receiving part of the photoelectric conversion section is in contact with an insulating layer.
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