发明申请
US20080075843A1 Method of Forming a Phase-Change Memory Unit and Method of Manufacturing a Phase-Change Memory Device Using the Same
审中-公开
形成相变存储器单元的方法和使用该相变存储器单元的相变存储器件的制造方法
- 专利标题: Method of Forming a Phase-Change Memory Unit and Method of Manufacturing a Phase-Change Memory Device Using the Same
- 专利标题(中): 形成相变存储器单元的方法和使用该相变存储器单元的相变存储器件的制造方法
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申请号: US11860829申请日: 2007-09-25
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公开(公告)号: US20080075843A1公开(公告)日: 2008-03-27
- 发明人: Bong-Jin Kuh , Yong-Ho Ha , Doo-Hwan Park , Han-Bong Ko , Sang-Wook Lim , Hee-Ju Shin
- 申请人: Bong-Jin Kuh , Yong-Ho Ha , Doo-Hwan Park , Han-Bong Ko , Sang-Wook Lim , Hee-Ju Shin
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR2006-94225 20060927
- 主分类号: B05D5/12
- IPC分类号: B05D5/12
摘要:
In a method of manufacturing a phase-change memory unit, a lower electrode electrically connected to a contact region is formed on a substrate. A preliminary phase-change material layer is formed on the lower electrode using a chalcogenide compound doped with carbon, or carbon and nitrogen. A phase-change material layer is obtained by doping a stabilizing metal into the preliminary phase-change material layer. An upper electrode is formed on the phase-change material layer. Since the phase-change material layer may have improved electrical characteristics, stability of phase transition and thermal stability, the phase-change memory unit may have reduced set resistance, enhanced durability, improved reliability, increased sensing margin, reduced driving current, etc.
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