发明申请
- 专利标题: Projection optical system, exposure apparatus, and exposure method
- 专利标题(中): 投影光学系统,曝光装置和曝光方法
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申请号: US11984192申请日: 2007-11-14
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公开(公告)号: US20080079924A1公开(公告)日: 2008-04-03
- 发明人: Hideki Komatsuda , Tomowaki Takahashi , Masayuki Suzuki
- 申请人: Hideki Komatsuda , Tomowaki Takahashi , Masayuki Suzuki
- 申请人地址: JP Tokyo 100-8331 JP Tokyo 146-8501
- 专利权人: Nikon Corporation,Canon Kabushiki Kaisha
- 当前专利权人: Nikon Corporation,Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo 100-8331 JP Tokyo 146-8501
- 优先权: JP2004-184657 20040623
- 主分类号: G03B27/72
- IPC分类号: G03B27/72
摘要:
A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially uniform over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship.
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