发明申请
- 专利标题： HYDRAULIC-FACILITATED CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD
- 专利标题（中）： 液压辅助接触平面设备，系统和方法
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申请号： US11548216申请日： 2006-10-10
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公开(公告)号： US20080084006A1公开(公告)日： 2008-04-10
- 发明人: Jun Gao , Wei Wu , Carl Picciotto
- 申请人： Jun Gao , Wei Wu , Carl Picciotto
- 主分类号： B29C59/00
- IPC分类号： B29C59/00
摘要：
A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.
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