发明申请
- 专利标题: Oxime Derivatives And Use Thereof As Latent Acids
- 专利标题(中): 肟衍生物及其用作潜伏酸
-
申请号: US11632687申请日: 2005-07-11
-
公开(公告)号: US20080085458A1公开(公告)日: 2008-04-10
- 发明人: Hitoshi Yamato , Toshikage Asakura , Tobias Hintermann
- 申请人: Hitoshi Yamato , Toshikage Asakura , Tobias Hintermann
- 优先权: EP04103453.9 20040720
- 国际申请: PCT/EP05/53296 WO 20050711
- 主分类号: C07C291/06
- IPC分类号: C07C291/06 ; C07D209/56 ; G03F1/00
摘要:
The invention pertain to novel photoacid generator compounds of the formula I, II or III wherein R1 is for example C1-C18alkylsulfonyl or phenylsulfonyl, phenyl-C1-C3alkylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R1 is a group X1, X2 and X3 independently of each other are O or S; R′1, is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R2 is halogen or C1-C10haloalkyl; X is halogen; Ar1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar′1 is heteroarylene, optionally substituted; R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.
公开/授权文献
- US07687220B2 Oxime derivatives and use thereof as latent acids 公开/授权日:2010-03-30
信息查询