Invention Application
- Patent Title: Process monitoring system and method
- Patent Title (中): 过程监控系统和方法
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Application No.: US10817104Application Date: 2004-04-01
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Publication No.: US20080092088A1Publication Date: 2008-04-17
- Inventor: Youval Nehmadi , Zamir Abraham , Gil Sod-Moriah , Yair Eran , Chen Ofek , Yaron Cohen , Ariel Ben-Porath
- Applicant: Youval Nehmadi , Zamir Abraham , Gil Sod-Moriah , Yair Eran , Chen Ofek , Yaron Cohen , Ariel Ben-Porath
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets.The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.
Public/Granted literature
- US07587700B2 Process monitoring system and method for processing a large number of sub-micron measurement targets Public/Granted day:2009-09-08
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