Process monitoring system and method for processing a large number of sub-micron measurement targets
    3.
    发明授权
    Process monitoring system and method for processing a large number of sub-micron measurement targets 有权
    用于处理大量亚微米测量目标的过程监控系统和方法

    公开(公告)号:US07587700B2

    公开(公告)日:2009-09-08

    申请号:US10817104

    申请日:2004-04-01

    IPC分类号: G06F17/50

    摘要: The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets.The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.

    摘要翻译: 本发明提供了一种方法,其包括以下阶段:(i)接收表示包含亚微米测量目标的对象的一部分的设计信息,(ii)处理所接收的设计信息以提供大量的测量目标; 和(iii)将目标测量参数与大量测量目标中的每一个相关联。 本发明提供了一种系统,其包括:(i)接口,用于接收表示包含亚微米测量目标的物体层的一部分的设计信息; 以及(ii)耦合到所述接口的处理器,用于处理所接收的设计信息以提供大量的测量目标; 并且用于将目标测量参数与大量测量目标中的每一个相关联。

    Process monitoring system and method
    4.
    发明申请
    Process monitoring system and method 有权
    过程监控系统和方法

    公开(公告)号:US20080092088A1

    公开(公告)日:2008-04-17

    申请号:US10817104

    申请日:2004-04-01

    IPC分类号: G06F17/50

    摘要: The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets.The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.

    摘要翻译: 本发明提供了一种方法,其包括以下阶段:(i)接收表示包含亚微米测量目标的对象的一部分的设计信息,(ii)处理所接收的设计信息以提供大量的测量目标; 和(iii)将目标测量参数与大量测量目标中的每一个相关联。 本发明提供了一种系统,其包括:(i)接口,用于接收表示包含亚微米测量目标的物体层的一部分的设计信息; 以及(ii)耦合到所述接口的处理器,用于处理所接收的设计信息以提供大量的测量目标; 并且用于将目标测量参数与大量测量目标中的每一个相关联。