发明申请
US20080092955A1 Solar cell structures using porous column TiO2 films deposited by CVD
审中-公开
使用通过CVD沉积的多孔柱TiO 2膜的太阳能电池结构
- 专利标题： Solar cell structures using porous column TiO2 films deposited by CVD
- 专利标题（中）： 使用通过CVD沉积的多孔柱TiO 2膜的太阳能电池结构
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申请号： US11582197申请日： 2006-10-16
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公开(公告)号： US20080092955A1公开(公告)日： 2008-04-24
- 发明人: Fengyan Zhang , Robert A. Barrowcliff , Gregory M. Stecker , Sheng Teng Hsu
- 申请人： Fengyan Zhang , Robert A. Barrowcliff , Gregory M. Stecker , Sheng Teng Hsu
- 专利权人： Sharp Laboratories of America, Inc.
- 当前专利权人： Sharp Laboratories of America, Inc.
- 主分类号： H01L31/00
- IPC分类号： H01L31/00
摘要：
A method of fabricating a photovoltaic cell for use in a solar cell structure includes preparing a first substrate; preparing a TiO2 precursor; preparing a cold wall CVD chamber; placing the first substrate in the cold wall CVD chamber; forming a transparent conducting electrode on the first substrate; depositing a porous column TiO2 film on the transparent conducting electrode; depositing a photosensitive material in and on the porous column TiO2 film; forming a top electrode on the photovoltaic cell; and incorporating the photovoltaic cell into a solar cell structure. The method of the invention is suitable for forming photovoltaic cells which may be of the dye-sensitized solar cell (DSSC) type, having a liquid or solid-state electrolyte therein, or an ordered organic-inorganic heterojunction photovoltaic cell.
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