发明申请
- 专利标题: Method for making a perpendicular magnetic recording write head with a self aligned stitched write shield
- 专利标题(中): 一种具有自对准缝合写屏蔽的垂直磁记录写头的方法
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申请号: US12001350申请日: 2007-12-11
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公开(公告)号: US20080094750A1公开(公告)日: 2008-04-24
- 发明人: Cherng-Chyi Han , Kenichi Takano
- 申请人: Cherng-Chyi Han , Kenichi Takano
- 专利权人: Headway Technologies, Inc.
- 当前专利权人: Headway Technologies, Inc.
- 主分类号: G11B5/147
- IPC分类号: G11B5/147
摘要:
A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
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