摘要:
A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
摘要:
A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
摘要:
A PMR write head has a stitched shield formation which results in a strong perpendicular write field with sharp vertical gradients. The shape of the stitched shield is determined by two design parameters, d=½(WSWSLE-WMPTE), and TSWS, where WSWSLE is the width of the leading edge of the stitched shield in the ABS plane, WMPTE is the width of the trailing edge of the main magnetic pole in the ABS plane and TSWS is the thickness of the stitched shield. By a proper choice of these parameters, the write field of the head is sharply limited in the cross-track direction, so that adjacent track erasures are eliminated.
摘要翻译:PMR写头具有缝合的屏蔽结构,其形成具有尖锐垂直梯度的强垂直写入场。 缝合屏蔽的形状由两个设计参数d =½(W> SWSLE-> W> MP MP TE TE TE TE SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB and and and and and and and and) W SHSLE SUB>是ABS平面中缝合屏蔽的前缘的宽度,W> MPTE SUB>是ABS平面中主磁极的后缘的宽度 而T SWS SUB>是缝合屏蔽的厚度。 通过这些参数的适当选择,头部的写入场在交叉轨道方向上被大大限制,从而消除了相邻的轨迹擦除。
摘要:
A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
摘要:
A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
摘要:
A PMR write head has a stitched shield formation which results in a strong perpendicular write field with sharp vertical gradients. The shape of the stitched shield is determined by two design parameters, d=½(WSWSLE−WMPTE), and TSWS, where WSWSLE is the width of the leading edge of the stitched shield in the ABS plane, WMPTE is the width of the trailing edge of the main magnetic pole in the ABS plane and TSWS is the thickness of the stitched shield. By a proper choice of these parameters, the write field of the head is sharply limited in the cross-track direction, so that adjacent track erasures are eliminated.
摘要翻译:PMR写头具有缝合的屏蔽结构,其形成具有尖锐垂直梯度的强垂直写入场。 缝合屏蔽的形状由两个设计参数d =½(W> SWSLE-> W> MP MP TE TE TE TE SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB and and and and and and and and) W SHSLE SUB>是ABS平面中缝合屏蔽的前缘的宽度,W> MPTE SUB>是ABS平面中主磁极的后缘的宽度 而T SWS SUB>是缝合屏蔽的厚度。 通过这些参数的适当选择,头部的写入场在交叉轨道方向上被大大限制,从而消除了相邻的轨迹擦除。
摘要:
A microwave assisted magnetic recording writer is disclosed with an octagonal write pole having a top portion including a trailing edge that is self aligned to a spin transfer oscillator (STO). Leading and trailing edges are connected by two sidewalls each having three sections. A first section on each side is coplanar with the STO sidewalls and is connected to a sloped second section at a first corner. Each second section is connected to a third section at a second corner where the distance between second corners is greater than the distance between first corners. A method of forming the writer begins with a trapezoidal shaped write pole in an insulation layer. Two ion beam etch (IBE) steps are used to shape top and middle portions of the write pole and narrow the pole width to
摘要:
A method of making a perpendicular magnetic recording (PMR) head with single or double coil layers and with a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
摘要:
A method of making a perpendicular magnetic recording (PMR) head with single or double coil layers and with a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
摘要:
A microwave assisted magnetic recording writer is disclosed with an octagonal write pole having a top portion including a trailing edge that is self aligned to a spin transfer oscillator (STO). Leading and trailing edges are connected by two sidewalls each having three sections. A first section on each side is coplanar with the STO sidewalls and is connected to a sloped second section at a first corner. Each second section is connected to a third section at a second corner where the distance between second corners is greater than the distance between first corners. A method of forming the writer begins with a trapezoidal shaped write pole in an insulation layer. Two ion beam etch (IBE) steps are used to shape top and middle portions of the write pole and narrow the pole width to