发明申请
- 专利标题： Lithographic apparatus and method
- 专利标题（中）： 平版印刷设备和方法
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申请号： US11589990申请日： 2006-10-31
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公开(公告)号： US20080100816A1公开(公告)日： 2008-05-01
- 发明人: Heine Melle Mulder , Wilfred Edward Endendijk , Edwin Eduard Nicolaas Josephus Krijnen
- 申请人： Heine Melle Mulder , Wilfred Edward Endendijk , Edwin Eduard Nicolaas Josephus Krijnen
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/80
- IPC分类号： G03B27/80
摘要：
An illuminator for a lithographic apparatus is disclosed, the illuminator including an array of individually controllable reflective elements capable of changing the angular intensity distribution of an incident illumination beam of radiation, wherein the array of individually controllable reflective elements is provided on a curved support structure, or the array of individually controllable reflective elements is arranged to serve as a curved reflective surface.
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