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发明申请
US20080102402A1 MONOMER HAVING SULFONYL GROUP, POLYMER THEREOF AND PHOTORESIST COMPOSITION INCLUDING THE SAME 失效
具有磺基的单体，其聚合物和包括其的光学组合物

MONOMER HAVING SULFONYL GROUP, POLYMER THEREOF AND PHOTORESIST COMPOSITION INCLUDING THE SAME
摘要：
A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1˜C20 alkyl group, a C4˜C20 cycloalkyl group, a C6˜C20 aryl group or a C7˜C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a ring.
摘要（中）：

公开了具有磺酰基的光致抗蚀剂单体，其聚合物和含有它们的光致抗蚀剂组合物。 光致抗蚀剂单体由下式表示。 其中R *是氢原子或甲基，R 1和R 2独立地是C 1 -C 20 C 1 -C 20烷基，C 4 -C 20环烷基，C 6 -C 20环烷基，C 1 -C 20烷基， 芳基或C 7-20芳基烷基，R 1和R 2中的一个可能不存在 ，并且R 1和R 2可以连接形成环。

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