发明申请
- 专利标题: Vertical Microprobes for Contacting Electronic Components and Method for Making Such Probes
- 专利标题(中): 用于接触电子元件的垂直微孔及其制造方法
-
申请号: US11928707申请日: 2007-10-30
-
公开(公告)号: US20080106280A1公开(公告)日: 2008-05-08
- 发明人: Richard Chen , Ezekiel Kruglick , Christopher Bang , Vacit Arat , Adam Cohen , Kieun Kim , Gang Zhang , Dennis Smalley
- 申请人: Richard Chen , Ezekiel Kruglick , Christopher Bang , Vacit Arat , Adam Cohen , Kieun Kim , Gang Zhang , Dennis Smalley
- 专利权人: Microfabrica Inc.
- 当前专利权人: Microfabrica Inc.
- 主分类号: G01R1/067
- IPC分类号: G01R1/067
摘要:
Multilayer probe structures for testing or otherwise making electrical contact with semiconductor die or other electronic components are electrochemically fabricated via depositions of one or more materials in a plurality of overlaying and adhered layers. In some embodiments the structures may include configurations intended to enhance functionality, buildability, or both.
信息查询