发明申请
US20080110567A1 PLASMA CONFINEMENT BAFFLE AND FLOW EQUALIZER FOR ENHANCED MAGNETIC CONTROL OF PLASMA RADIAL DISTRIBUTION
审中-公开
用于等离子体辐射分布的增强磁控制的等离子体限制气体和流量均衡器
- 专利标题: PLASMA CONFINEMENT BAFFLE AND FLOW EQUALIZER FOR ENHANCED MAGNETIC CONTROL OF PLASMA RADIAL DISTRIBUTION
- 专利标题(中): 用于等离子体辐射分布的增强磁控制的等离子体限制气体和流量均衡器
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申请号: US11751575申请日: 2007-05-21
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公开(公告)号: US20080110567A1公开(公告)日: 2008-05-15
- 发明人: Matthew L. Miller , Daniel J. Hoffman , Steven C. Shannon , Michael Kutney , James Carducci , Andrew Nguyen
- 申请人: Matthew L. Miller , Daniel J. Hoffman , Steven C. Shannon , Michael Kutney , James Carducci , Andrew Nguyen
- 主分类号: H01L21/306
- IPC分类号: H01L21/306
摘要:
A plasma reactor with plasma confinement and plasma radial distribution capability. The reactor comprises a reactor chamber including a side wall and a workpiece support pedestal in the chamber and defining a pumping annulus between the pedestal and side wall and a pumping port at a bottom of the pumping annulus. The reactor further comprises a means for confining gas flow in an axial direction through the pumping annulus to prevent plasma from flowing to the pumping port. The reactor further comprises a means for compensating for asymmetry of gas flow pattern across the pedestal arising from placement of the pumping port. The reactor further comprises a means for controlling plasma distribution having an inherent tendency to promote edge-high plasma density distribution. The means for confining gas flow is depressed below the workpiece support sufficiently to compensate for the edge-high plasma distribution tendency of the means for controlling plasma distribution.
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