发明申请
- 专利标题: SEMICONDUCTOR DEVICE
- 专利标题(中): 半导体器件
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申请号: US11939976申请日: 2007-11-14
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公开(公告)号: US20080116486A1公开(公告)日: 2008-05-22
- 发明人: Wataru SAITO , Akira Yoshioka , Hidetoshi Fujimoto , Takao Noda , Yasunobu Saito , Tomohiro Nitta , Yorito Kakiuchi
- 申请人: Wataru SAITO , Akira Yoshioka , Hidetoshi Fujimoto , Takao Noda , Yasunobu Saito , Tomohiro Nitta , Yorito Kakiuchi
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-311450 20061117
- 主分类号: H01L29/80
- IPC分类号: H01L29/80
摘要:
A semiconductor device includes: a first semiconductor layer of p-type AlxGa1-xN (0≦x≦1); a second semiconductor layer of n-type AlyGa1-yN (0
公开/授权文献
- US07728354B2 Semiconductor device 公开/授权日:2010-06-01
信息查询
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