In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixture that steps and holds the substrate does not bear the load of imprinting. The balance allows use of a high resolution aligning stage to carry the substrate and to maintain high accuracy of positioning without being shifted by change of load. With this method, sufficient imprint pressure can be used to obtain high quality patterning, a thin and uniform residual layer, and a high fidelity pattern.