发明申请
US20080131333A1 Lateral-flow waste gas treatment device using nonthermal plasma
审中-公开
使用非热等离子体的侧流废气处理装置
- 专利标题： Lateral-flow waste gas treatment device using nonthermal plasma
- 专利标题（中）： 使用非热等离子体的侧流废气处理装置
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申请号： US11607890申请日： 2006-12-04
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公开(公告)号： US20080131333A1公开(公告)日： 2008-06-05
- 发明人: Chin-Ching Tzeng , Shiaw-Huei Chen
- 申请人： Chin-Ching Tzeng , Shiaw-Huei Chen
- 申请人地址： TW Taoyuan
- 专利权人： High Power-Factor AC/DC Converter with Parallel Power Processing,Atomic Energy Council-Institute of Nuclear Energy Research
- 当前专利权人： High Power-Factor AC/DC Converter with Parallel Power Processing,Atomic Energy Council-Institute of Nuclear Energy Research
- 当前专利权人地址： TW Taoyuan
- 主分类号： B01D53/32
- IPC分类号： B01D53/32
摘要：
A lateral-flow dielectric barrier discharging reactor unit is designed to effectively process waste gas. Nonthermal plasma is obtained through high voltage gas breakdown for processing the waste gas. Reactor units can be arranged and integrated in a serial and/or parallel way with flow uniformity and smoothness for processing a great amount of waste gas with merits of simplicity and low cost.
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