发明申请
- 专利标题: Alkali soluble polymer and positive working photosensitive resin composition using the same
- 专利标题(中): 碱溶性聚合物和正性感光树脂组合物使用
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申请号: US11979466申请日: 2007-11-02
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公开(公告)号: US20080131813A1公开(公告)日: 2008-06-05
- 发明人: Tomohiro Etou , Eiji Watanabe , Ryouta Mineo
- 申请人: Tomohiro Etou , Eiji Watanabe , Ryouta Mineo
- 专利权人: CHISSO CORPORATION
- 当前专利权人: CHISSO CORPORATION
- 优先权: JP2006-299052 20061102
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; C08F24/00
摘要:
The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.
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