A cleaning apparatus for immersion light exposure includes a cleaning apparatus main body including a mechanism configured to perform a cleaning process on the substrate, and a control section configured to control respective components of the cleaning apparatus main body. The control section is arranged to fabricate a new process recipe in response to input of a surface state of a film formed on a substrate, such that the new process recipe contains hardware conditions and/or process conditions corresponding to the surface state, with reference to relationships stored therein between parameter values representing a surface state of a film formed on a substrate and hardware conditions and/or process conditions for performing suitable cleaning for the parameter values; and to control the cleaning apparatus main body to perform a cleaning process in accordance with the new process recipe.