发明申请
- 专利标题: High Voltage Shottky Diodes
- 专利标题(中): 高压肖特基二极管
-
申请号: US11947066申请日: 2007-11-29
-
公开(公告)号: US20080135970A1公开(公告)日: 2008-06-12
- 发明人: Yong-don Kim , Sun-hyun Kim , Jung-soo Yoo , Ji-hoon Cho , Seung-teck Lee
- 申请人: Yong-don Kim , Sun-hyun Kim , Jung-soo Yoo , Ji-hoon Cho , Seung-teck Lee
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR2006-124064 20061207
- 主分类号: H01L29/872
- IPC分类号: H01L29/872
摘要:
High voltage schottky diodes are provided including a first conductivity type semiconductor substrate and a second conductivity type well region defined by the substrate. A first conductive film is provided on a surface of the substrate including the well. A conductive electrode is provided on at least one side of the first conductive film above the substrate including the well. An insulating film is provided between the conductive electrode and the substrate. A cathode contact region is provided outside the conductive electrode remote from the first conductive film. The cathode contact region is doped with high concentration impurities having a second conductive type.
信息查询
IPC分类: