发明申请
- 专利标题： 8-Mirror microlithography projection objective
- 专利标题（中）： 8镜微光投影物镜
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申请号： US12012825申请日： 2008-02-06
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公开(公告)号： US20080137183A1公开(公告)日： 2008-06-12
- 发明人: Hans-Jurgen Mann , Wilhelm Ulrich , Gunther Seitz
- 申请人： Hans-Jurgen Mann , Wilhelm Ulrich , Gunther Seitz
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE Oberkochen
- 优先权： DE10052289.0 20001020
- 主分类号： G02B27/18
- IPC分类号： G02B27/18 ; G02B17/06
摘要：
A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light path is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.
公开/授权文献
- US07508580B2 8-mirror microlithography projection objective 公开/授权日：2009-03-24