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公开(公告)号：US20110273791A1
公开(公告)日：2011-11-10
申请号：US13183823
申请日：2011-07-15
申请人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B17/02
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译： 通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像 侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。
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公开(公告)号：US20070195317A1
公开(公告)日：2007-08-23
申请号：US11656878
申请日：2007-01-23
IPC分类号： G01N21/00
CPC分类号： G02B27/0043 , G02B17/0647 , G03F7/70233 , G03F7/70258 , Y10S359/90
摘要： An objective and method of fabricating an objective, particularly a projection objective for microlithography, comprising a plurality of optical elements. In one example, the method comprises acts of determining groups of optically similar optical elements or surfaces having at least two members, determining wavefront deformations by the optical elements or surfaces, determining the necessary corrections for the optical elements or surfaces of a group, and performing the corrections for a group at a group member.
摘要翻译： 一种制造物镜的目的和方法，特别是用于微光刻的投影物镜，其包括多个光学元件。 在一个示例中，该方法包括确定具有至少两个构件的光学相似的光学元件或表面的组的动作，确定光学元件或表面的波前变形，确定组的光学元件或表面的必要校正，以及执行 一个团体成员的一个组的更正。
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公开(公告)号：US20050264787A1
公开(公告)日：2005-12-01
申请号：US11133531
申请日：2005-05-20
申请人： Hans-Jurgen Mann , Wolfgang Singer
发明人： Hans-Jurgen Mann , Wolfgang Singer
CPC分类号： G03F7/70233 , G02B5/005 , G02B17/0657 , G03F7/7025
摘要： A projection lens for a EUV microlithographic projection exposure apparatus comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has a non-round aperture with an edge contour that may be configured such two rays of a light bundle disposed symmetrically with respect to a chief ray are treated equally, i.e. either both rays pass through the diaphragm aperture or both are blocked by the diaphragm.
摘要翻译： 用于EUV微光刻投影曝光装置的投影透镜包括在透镜的反射镜（S 2）的前方设置有距离（D）的光阑（BL）。 隔膜（BL）具有非圆形孔口，其边缘轮廓可以被配置为相对于主射线对称设置的两束光线被均等地对待，即两条光线通过光阑孔径或两者都是 被隔膜封闭
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公开(公告)号：US20080316451A1
公开(公告)日：2008-12-25
申请号：US12198344
申请日：2008-08-26
申请人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G03F7/20
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译： 通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像 侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。
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5.发明申请公开(公告)号：US20070188729A1
公开(公告)日：2007-08-16
申请号：US11738935
申请日：2007-04-23
申请人： Hans-Jurgen Mann , Wolfgang Singer
发明人： Hans-Jurgen Mann , Wolfgang Singer
IPC分类号： G03B27/54
CPC分类号： G03F7/70233 , G02B5/005 , G02B17/0657 , G03F7/7025
摘要： A projection lens for a EUV microlithographic projection exposure apparatus comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has a non-round aperture with an edge contour that may be configured such two rays of a light bundle disposed symmetrically with respect to a chief ray are treated equally, i.e. either both rays pass through the diaphragm aperture or both are blocked by the diaphragm.
摘要翻译： 用于EUV微光刻投影曝光装置的投影透镜包括在透镜的反射镜（S 2）的前方设置有距离（D）的光阑（BL）。 隔膜（BL）具有非圆形孔口，其边缘轮廓可以被配置为相对于主射线对称设置的两束光束被均等地对待，即两条光线通过隔膜孔径或两者都是 被隔膜封闭
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公开(公告)号：US07209286B2
公开(公告)日：2007-04-24
申请号：US11102524
申请日：2005-04-08
申请人： Hans-Jurgen Mann , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , Wilhelm Ulrich
CPC分类号： G03F7/70291 , G02B17/0652 , G03F7/70225 , G03F7/70233
摘要： In accordance with the present invention, a projection exposure apparatus includes an illuminating system to illuminate a drivable micromirror array and an objective which projects the drivable micromirror array onto the photosensitive substrate. The objective includes mirrors which are arranged coaxial with respect to a common optical axis. The objective can be a catoptric objective and can have a numerical aperture at the substrate greater than 0.1 and can have an imaging scale ratio of greater than 20:1. The objective can also include at least two partial objectives with an intermediate image plane between the at least two partial objectives and can consist of mirrors that are coated with reflecting layers which are adapted to reflect two mutually separated operating wavelengths.
摘要翻译： 根据本发明，投影曝光装置包括用于照亮可驱动微镜阵列的照明系统和将可驱动微镜阵列投影到感光基板上的物镜。 该目的包括相对于公共光轴同轴布置的反射镜。 目标可以是一个反射目标，并且可以在基板上具有大于0.1的数值孔径，并且可以具有大于20:1的成像比例。 该目的还可以包括至少两个部分目标，其中在至少两个部分目标之间具有中间图像平面，并且可以由涂覆有适于反射两个相互分离的工作波长的反射层的反射镜组成。
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7.发明授权公开(公告)号：US07190530B2
公开(公告)日：2007-03-13
申请号：US11356525
申请日：2006-02-16
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/0844 , G02B17/0856 , G03F7/70225
摘要： According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.
摘要翻译： 根据一个示例性实施例，提供了一种投影物镜，并且包括至少两个非平面（弯曲）反射镜，其中，沿着光线定义的下一个至最后的非平面镜与最后的非平面镜之间的轴向距离 路径大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。 在一个示例性实施例中，第一折射表面与单遍型透镜相关联。 当前目标形成具有至少约0.80或更高（例如0.95）的数值孔径的图像。 优选地，该目的不包括折叠反射镜，并且在两个反射镜之间不存在中间图像，以及物镜的瞳孔没有遮蔽。
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公开(公告)号：US20060232867A1
公开(公告)日：2006-10-19
申请号：US11317851
申请日：2005-12-22
申请人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/10
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译： 通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像 侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。
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公开(公告)号：US20060215272A1
公开(公告)日：2006-09-28
申请号：US11443077
申请日：2006-05-31
申请人： Toralf Gruner , Hans-Jurgen Mann
发明人： Toralf Gruner , Hans-Jurgen Mann
IPC分类号： G02B3/00
CPC分类号： G02B27/286 , G02B13/14 , G02B17/08 , G02B17/0892 , G03F7/70191 , G03F7/70225 , G03F7/70566
摘要： An objective in a microlithographic projection exposure apparatus has a first optical element that has polarization dependent properties causing intensity fluctuations in an image plane of the objective. These fluctuations may be produced by a second optical element that is arranged downstream of the first optical element. A gray filter disposed in the beam path reduces the intensity fluctuations.
摘要翻译： 微光刻投影曝光装置中的目的是具有第一光学元件，该第一光学元件具有导致物镜的图像平面中的强度波动的偏振相关特性。 这些波动可以由布置在第一光学元件的下游的第二光学元件产生。 布置在光束路径中的灰色滤光器减小了强度波动。
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公开(公告)号：US20050180011A1
公开(公告)日：2005-08-18
申请号：US11102524
申请日：2005-04-08
申请人： Hans-Jurgen Mann , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B13/14 , G02B13/18 , G02B13/24 , G02B17/06 , G02B17/08 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70291 , G02B17/0652 , G03F7/70225 , G03F7/70233
摘要： An objective is configured with a first partial objective and a second partial objective. The first partial objective, which projects a first field plane onto an intermediate image, has a first, convex mirror and a second, concave mirror. The second partial objective, which projects the intermediate image onto a second field plane, has a third and a fourth mirror, both concave. All of the four mirrors have central mirror apertures. The axial distance between the first and second mirrors is in a ratio between 0.95 and 1.05 relative to the distance between the second mirror and the intermediate image. The axial distance ZM3-IM between the third mirror and the second field plane conforms to the relationship 0.03 · Du M3 + 5.0 mm
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