Invention Application
- Patent Title: ADDITIVE FOR CHROMIUM ELECTROLYTES
- Patent Title (中): 铬电解液添加剂
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Application No.: US11849491Application Date: 2007-09-04
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Publication No.: US20080142372A1Publication Date: 2008-06-19
- Inventor: Lorenz Laser , Matthias Weiss , Frank Honselmann
- Applicant: Lorenz Laser , Matthias Weiss , Frank Honselmann
- Assignee: GOLDSCHMIDT TIB GMBH
- Current Assignee: GOLDSCHMIDT TIB GMBH
- Priority: DE102006042076.4 20060905
- Main IPC: C25D3/10
- IPC: C25D3/10

Abstract:
The fluorine surfactant-free, long-term-stable and biodegradable additive for chromium electrolytes lowers the surface tension and hence improves the chromium deposition process, especially in the application for the electrolytical chromium-plating. Preferred additives are CH3(CH2)nSO3H and the salts thereof with n from 10 to 18. These additives are also useful as component in polymer mordants as pretreatments for polymer metallizations.
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