发明申请
- 专利标题: Semiconductor integrated circuit
- 专利标题(中): 半导体集成电路
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申请号: US11979669申请日: 2007-11-07
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公开(公告)号: US20080142898A1公开(公告)日: 2008-06-19
- 发明人: Shinji Watanabe , Daisaku Ikoma , Kyoji Yamashita , Katsuhiro Ootani
- 申请人: Shinji Watanabe , Daisaku Ikoma , Kyoji Yamashita , Katsuhiro Ootani
- 优先权: JP2006-339914 20061218
- 主分类号: H01L27/092
- IPC分类号: H01L27/092
摘要:
An integrated circuit includes: a first well of a first conductivity type; a second well of a second conductivity type coming into contact with the first well at a well boundary extending in a gate length direction; a first transistor having a first active region of the second conductivity type provided in the first well; and a second transistor which has a second active region of the second conductivity type provided in the first well and differing from the first active region in length in a gate width direction. The center location of the first active region in the gate width direction is aligned with the center location of the second active region in the gate width direction with reference to the well boundary.
公开/授权文献
- US07476957B2 Semiconductor integrated circuit 公开/授权日:2009-01-13
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