发明申请
US20080149913A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
审中-公开
半导体存储器件及其制造方法
- 专利标题: SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 半导体存储器件及其制造方法
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申请号: US11962862申请日: 2007-12-21
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公开(公告)号: US20080149913A1公开(公告)日: 2008-06-26
- 发明人: Hiroyasu TANAKA , Ryota Katsumata , Hideaki Aochi , Masaru Kito , Masaru Kidoh , Mitsuru Sato
- 申请人: Hiroyasu TANAKA , Ryota Katsumata , Hideaki Aochi , Masaru Kito , Masaru Kidoh , Mitsuru Sato
- 优先权: JP2006-349538 20061226
- 主分类号: H01L27/105
- IPC分类号: H01L27/105 ; H01L21/8239 ; H01L45/00
摘要:
A semiconductor memory device is disclosed, which includes a first memory cell array formed on a semiconductor substrate and composed of a plurality of memory cells stacked in layers each having a characteristic change element and a vertical type memory cell transistor connected in parallel to each other, a plurality of second memory cell arrays formed on the semiconductor substrate and having the same structure as the first memory cell array, and arranged in an X direction with respect to the first memory cell array, and a plurality of third memory cell arrays formed on the semiconductor substrate and having the same structure as the first memory cell array, and arranged in a Y direction with respect to the first memory cell array, wherein a gate voltage is applied to gates of the vertical type memory cell transistors of the first to third memory cell arrays in a same layer.
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