- 专利标题： Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
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申请号： US12073128申请日： 2008-02-29
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公开(公告)号： US20080151361A1公开(公告)日： 2008-06-26
- 发明人: Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Nikolaevitch Salashchenko
- 申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Nikolaevitch Salashchenko
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G02B5/20
- IPC分类号： G02B5/20
摘要：
A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.