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1.发明授权Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权多层光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07639418B2
公开(公告)日：2009-12-29
申请号：US12073128
申请日：2008-02-29
申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Nikolaevitch Salashchenko
发明人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Nikolaevitch Salashchenko
IPC分类号： G02B5/20
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
摘要翻译： 多层光谱纯度过滤器提高了极紫外（EUV）辐射的光谱纯度，并且还收集了辐射源发射的碎屑。
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公开(公告)号：US20080151361A1
公开(公告)日：2008-06-26
申请号：US12073128
申请日：2008-02-29
申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Nikolaevitch Salashchenko
发明人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Nikolaevitch Salashchenko
IPC分类号： G02B5/20
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
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3.发明授权Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权多层光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07372623B2
公开(公告)日：2008-05-13
申请号：US11091923
申请日：2005-03-29
申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Salashchenko
发明人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Salashchenko
IPC分类号： G02B5/20
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
摘要翻译： 多层光谱纯度过滤器提高了极紫外（EUV）辐射的光谱纯度，并且还收集了辐射源发射的碎屑。
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4.发明申请Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权多层光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US20060221440A1
公开(公告)日：2006-10-05
申请号：US11091923
申请日：2005-03-29
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filters improveS the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam and also collect debris emitted from a radiation source.
摘要翻译： 多层光谱纯度滤光片提高极紫外（EUV）辐射束的光谱纯度，并且还收集从辐射源发射的碎片。
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公开(公告)号：US06359969B1
公开(公告)日：2002-03-19
申请号：US09641455
申请日：2000-08-18
申请人： Leonid Shmaenok
发明人： Leonid Shmaenok
IPC分类号： G21K300
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70191 , G03F7/70916
摘要： An apparatus, suited, for example, for extreme ultraviolet lithography, includes a radiation source and a processing organ for processing the radiation from the radiation source. Between the radiation source and the processing organ a filter is placed which, in the radial direction from the radiation source, comprises a plurality of foils or plates.
摘要翻译： 适用于例如用于极紫外光刻的装置包括辐射源和用于处理来自辐射源的辐射的处理器具。 在辐射源和处理器之间放置一个过滤器，其在辐射源的径向方向上包括多个箔或板。
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公开(公告)号：USRE44120E1
公开(公告)日：2013-04-02
申请号：US13276888
申请日：2011-10-19
申请人： Leonid Shmaenok
发明人： Leonid Shmaenok
IPC分类号： G21K3/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70191 , G03F7/70916
摘要： An apparatus, suited, for example, for extreme ultraviolet lithography, includes a radiation source and a processing organ for processing the radiation from the radiation source. Between the radiation source and the processing organ a filter is placed which, in the radial direction from the radiation source, comprises a plurality of foils or plates.
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