发明申请
- 专利标题： Formation of low resistance damascene coils
- 专利标题（中）： 形成低阻力镶嵌线圈
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申请号： US11644446申请日： 2006-12-22
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公开(公告)号： US20080151424A1公开(公告)日： 2008-06-26
- 发明人: Daniel Wayne Bedell , David Patrick Druist , Edward Hin Pong Lee , Jennifer Ai-Ming Loo , Vladimir Nikitin
- 申请人： Daniel Wayne Bedell , David Patrick Druist , Edward Hin Pong Lee , Jennifer Ai-Ming Loo , Vladimir Nikitin
- 主分类号： G11B5/17
- IPC分类号： G11B5/17
摘要：
In one embodiment and method of the present invention, a coil of a write head is created by forming a P1 pedestal layer and a back gap layer and further forming a coil pattern consistent with the coil to be formed and insulator spacers dispersed in the coil pattern, using a non-damascene process, thereafter the coil is formed by plating using a damascene process.
公开/授权文献
- US07729084B2 Formation of low resistance damascene coils 公开/授权日：2010-06-01
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