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21 条记录 (耗时 0.013 秒)

    Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording
    4.
    发明授权
    Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording 失效
    用于制造用于垂直磁记录的磁通引​​导层的侧屏蔽的方法

    公开(公告)号：US07515381B2

    公开(公告)日：2009-04-07

    申请号：US11317917

    申请日：2005-12-22

    申请人： Amanda Baer ,  Daniel Wayne Bedell ,  Quang Le ,  Aron Pentek

    发明人： Amanda Baer ,  Daniel Wayne Bedell ,  Quang Le ,  Aron Pentek

    IPC分类号： G11B5/147 ,  G11B5/187

    CPC分类号： G11B5/3116 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/3163

    摘要： A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.

    摘要翻译： 一种用于垂直记录系统的磁头，其具有新的屏蔽结构，其提供例如来自写入磁头的写入线圈，成形层或返回磁极的外部磁场的卓越的磁屏蔽。 屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面，但是屏蔽结构的全部或一部分不像成形层那样厚，以便具有顶部 表面不延伸到与成形层相同的高度（在拖尾方向上）。 使屏蔽层延伸到比成形层更低的水平，通过减小来自写入极的磁通泄漏来提高磁性能，并且还提供制造优点，例如在写入磁极的制造期间。 这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。

    Method of fabricating a magnetic head
    7.
    发明授权
    Method of fabricating a magnetic head 有权
    制造磁头的方法

    公开(公告)号：US07770283B2

    公开(公告)日：2010-08-10

    申请号：US11347356

    申请日：2006-02-03

    申请人： Daniel Wayne Bedell ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang

    发明人： Daniel Wayne Bedell ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3116 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A multi-step process for notching the P1 pole of the write head element of a magnetic head. In a first step following the fabrication of the P2 pole tip, a layer of protective material is deposited on the approximately vertical side surfaces of the P2 pole tip. Thereafter, a first ion milling step, utilizing a species such as argon, is performed to mill through the write gap layer and to notch into the P1 pole layer therebelow. The removal of redeposited material from the side surfaces of the P2 pole tip is thereafter accomplished and the protective material formed on the side surfaces of the P2 pole tip protects the P2 pole tip during the redeposition clean up step. Thereafter, the protective material is removed from the side surfaces of the P2 pole tip, and a second ion milling step is performed to further notch the P1 pole material.

    摘要翻译： 用于切割磁头的写入头元件的P1极的多步骤过程。 在制造P2极尖之后的第一步骤中，在P2极尖的大致垂直侧表面上沉积有一层保护材料。 此后，进行利用物质如氩的第一离子研磨步骤，通过写入间隙层研磨并陷入其下方的P1极层。 然后，从P2极尖端的侧面去除再沉积材料，并且形成在P2极端部的侧表面上的保护材料在再沉积清洁步骤期间保护P2极尖。 然后，从P2极端部的侧面除去保护材料，进行第二离子研磨工序，进一步切断P1极材料。

    Magnetic head coil system and damascene/reactive ion etching method for manufacturing the same
    8.
    发明授权
    Magnetic head coil system and damascene/reactive ion etching method for manufacturing the same 失效
    磁头线圈系统和镶嵌/反应离子蚀刻方法制造相同

    公开(公告)号：US07380332B2

    公开(公告)日：2008-06-03

    申请号：US11040387

    申请日：2005-01-20

    申请人： Daniel Wayne Bedell ,  Richard Hsiao ,  James D. Jarratt ,  Patrick Rush Webb ,  Sue Siyang Zhang

    发明人： Daniel Wayne Bedell ,  Richard Hsiao ,  James D. Jarratt ,  Patrick Rush Webb ,  Sue Siyang Zhang

    IPC分类号： G11B5/17

    CPC分类号： G11B5/313 ,  G11B5/3123 ,  G11B5/3163 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/4906 ,  Y10T29/49064 ,  Y10T29/49073

    摘要： A system and method are provided for manufacturing a coil structure for a magnetic head. Initially, an insulating layer is deposited with a photoresist layer deposited on the insulating layer. Moreover, a silicon dielectric layer is deposited on the photoresist layer as a hard mask. The silicon dielectric layer is then masked. A plurality of channels is subsequently formed in the silicon dielectric layer using reactive ion etching (i.e. CF4/CHF3). The silicon dielectric layer is then used as a hard mask to transfer the channel pattern in the photoresist layer using reactive ion etching with, for example, H2/N2/CH3F/C2H4 reducing chemistry. To obtain an optimal channel profile with the desired high aspect ratio, channel formation includes a first segment defining a first angle and a second segment defining a second angle. Thereafter, a conductive seed layer is deposited in the channels and the channels are filled with a conductive material to define a coil structure. Chemical-mechanical polishing may then be used to planarize the conductive material.

    摘要翻译： 提供一种用于制造用于磁头的线圈结构的系统和方法。 首先，沉积有沉积在绝缘层上的光致抗蚀剂层的绝缘层。 此外，硅介电层作为硬掩模沉积在光致抗蚀剂层上。 然后掩蔽硅介电层。 随后使用反应离子蚀刻（即CF 4 / CH 3）3在硅介电层中形成多个通道。 然后将硅介电层用作硬掩模，以使用例如H 2/2 N 2 / CH的反应离子蚀刻将光致抗蚀剂层中的沟道图案转印 还原化学反应。 为了获得具有期望的高纵横比的最佳通道轮廓，通道形成包括限定第一角度的第一段和限定第二角度的第二段。 此后，导电种子层沉积在通道中，并且通道填充有导电材料以限定线圈结构。 然后可以使用化学机械抛光来平坦化导电材料。

    Method for making magnetic write head
    9.
    发明授权
    Method for making magnetic write head 失效
    磁头写入方法

    公开(公告)号：US07380330B2

    公开(公告)日：2008-06-03

    申请号：US11186174

    申请日：2005-07-21

    申请人： Daniel Wayne Bedell ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

    发明人： Daniel Wayne Bedell ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49052

    摘要： After defining the P2 pole of a magnetic read head, alumina is deposited over it and planarized by CMP, with the portion of the alumina overlaying the ABS region of the P2 pole subsequently being masked by a photoresist layer and with the portions of the alumina overlaying the flare area, back gap region, and center tap regions of the P2 pole not being masked. A reactive ion mill is performed to expose the flare area, back gap region, and center tap regions of the P2 pole by removing the alumina over these portions, so that subsequent steps such as forming a layer of coiled conductors, forming a return pole, and forming stud connections along with removing the respective seed layers can be executed with the ABS region protected by the alumina and with the flare area, back gap region, and center tap region exposed.

    摘要翻译： 在定义磁读头的P2极之后，将氧化铝沉积在其上并通过CMP平坦化，其中覆盖P2极的ABS区域的氧化铝的部分随后被光致抗蚀剂层掩蔽，并且氧化铝的部分覆盖 P2极的光斑区域，背隙区域和中心抽头区域不被掩蔽。 通过在这些部分上除去氧化铝，进行反应离子磨，以暴露P2极的火炬区域，后隙区域和中心抽头区域，从而形成后续步骤，例如形成线圈导体层，形成返回极， 并且可以利用由氧化铝保护的ABS区域和暴露的火炬区域，后隙区域和中心抽头区域来执行形成螺柱连接以及移除相应的种子层。