发明申请
- 专利标题： REACTIVE SPUTTER DEPOSITION OF A TRANSPARENT CONDUCTIVE FILM
- 专利标题（中）： 透明导电膜的反应性溅射沉积
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申请号： US11614461申请日： 2006-12-21
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公开(公告)号： US20080153280A1公开(公告)日： 2008-06-26
- 发明人: Yanping Li , Yan Ye , Yong-Kee Chae , Tae Kyung Won , Ankur Kadam , Shuran Sheng , Liwei Li
- 申请人： Yanping Li , Yan Ye , Yong-Kee Chae , Tae Kyung Won , Ankur Kadam , Shuran Sheng , Liwei Li
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： H01L21/44
- IPC分类号： H01L21/44
摘要：
Methods for sputter depositing a transparent conductive oxide (TCO) layer are provided in the present invention. The transparent conductive oxide layer may be utilized as a back reflector in a photovoltaic device. In one embodiment, the method includes providing a substrate in a processing chamber, forming a first portion of a transparent conductive oxide layer on the substrate by a first sputter deposition step, and forming a second portion of the transparent conductive oxide layer by a second sputter deposition step.
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