- 专利标题: METHODS AND SYSTEMS FOR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS
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申请号: US11877170申请日: 2007-10-23
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公开(公告)号: US20080155444A1公开(公告)日: 2008-06-26
- 发明人: Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
- 申请人: Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
- 主分类号: G06F3/048
- IPC分类号: G06F3/048
摘要:
Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.
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