发明申请
US20080166584A1 FORMATION OF NANOSTRUCTURES COMPRISING COMPOSITIONALLY MODULATED FERROMAGNETIC LAYERS BY PULSED ECD
有权
通过脉冲ECD形成包含组成调节性FERROMAGNETIC层的纳米结构
- 专利标题: FORMATION OF NANOSTRUCTURES COMPRISING COMPOSITIONALLY MODULATED FERROMAGNETIC LAYERS BY PULSED ECD
- 专利标题(中): 通过脉冲ECD形成包含组成调节性FERROMAGNETIC层的纳米结构
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申请号: US11620480申请日: 2007-01-05
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公开(公告)号: US20080166584A1公开(公告)日: 2008-07-10
- 发明人: Hariklia Deligianni , Qiang Huang , Lubomyr T. Romankiw
- 申请人: Hariklia Deligianni , Qiang Huang , Lubomyr T. Romankiw
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01F1/00
- IPC分类号: H01F1/00 ; C25D5/02 ; B32B7/02
摘要:
The present invention is related to a method for forming a structure that contains alternating first and second ferromagnetic layers of different material compositions. A substrate containing a supporting matrix with at least one open pore and a conductive base layer is first formed. Electroplating of the substrate is then carried out in an electroplating solution that contains at least one ferromagnetic metal element and one or more additional, different metal elements. A pulsed current with alternating high and low potentials is applied to the conductive base layer of the substrate structure to thereby form alternating ferromagnetic layers of different material compositions in the open pore of the supporting matrix.
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