发明申请
US20080166670A1 Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition
失效
用于形成光敏聚合物复合物的组合物和使用该组合物制备含有银纳米颗粒的光敏聚合物复合物的方法
- 专利标题: Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition
- 专利标题(中): 用于形成光敏聚合物复合物的组合物和使用该组合物制备含有银纳米颗粒的光敏聚合物复合物的方法
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申请号: US11806902申请日: 2007-06-05
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公开(公告)号: US20080166670A1公开(公告)日: 2008-07-10
- 发明人: Jong Jin Park , Byung Ha Park , Young Ung Ha
- 申请人: Jong Jin Park , Byung Ha Park , Young Ung Ha
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2007-0001349 20070105
- 主分类号: G03C1/005
- IPC分类号: G03C1/005 ; G03C5/04
摘要:
A liquid-type composition for forming a photosensitive polymer complex and a method of preparing a photosensitive polymer complex containing silver nanoparticles using the same are provided. The composition for forming a photosensitive polymer complex includes a multifunctional epoxy resin, a photoacid generator, an organic solvent and a silver compound, or additionally includes a multifunctional acrylate resin and a photoinitiator, or an additive, e.g., a surfactant or a flow improver. This composition is applied, selectively exposed, and developed, thus preparing a photosensitive polymer complex, which contains silver nanoparticles uniformly dispersed and formed in the polymer pattern portion thereof through photo reduction and is therefore improved in terms of physical or chemical properties, e.g., heat resistance and wear resistance.
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