发明申请
US20080168946A1 Liquid supplying unit and method, facility for treating substrates with the unit, and method for treating substrates 审中-公开
液体供应单元和方法,用于处理基板的设备,以及用于处理基板的方法

Liquid supplying unit and method, facility for treating substrates with the unit, and method for treating substrates
摘要:
In a liquid supplying unit liquid is supplied from a buffer vessel to an external unit by pressurizing the liquid present in the buffer vessel using gas supplied to the buffer vessel. A pressure measuring member is provided to measure the pressure inside the buffer vessel, and when the pressure inside the buffer vessel is equal to or greater than a preset reference pressure during refilling of the buffer vessel, gas is discharged from the buffer vessel through a vent line.
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