发明申请
- 专利标题： MICROWAVE PLASMA PROCESSING APPARATUS
- 专利标题（中）： 微波等离子体加工设备
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申请号： US11969544申请日： 2008-01-04
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公开(公告)号： US20080173402A1公开(公告)日： 2008-07-24
- 发明人: Nobumasa Suzuki , Yusuke Fukuchi , Yuu Nishimura
- 申请人： Nobumasa Suzuki , Yusuke Fukuchi , Yuu Nishimura
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-012902 20070123
- 主分类号： C23C16/513
- IPC分类号： C23C16/513 ; B01J19/12 ; H01L21/306
摘要：
A radiofrequency wave electrode that is electrically insulated from a microwave introduction portion is provided, or the microwave introduction portion also functions as a radiofrequency wave electrode, and a radiofrequency wave is superimposed on a microwave for generating plasma. With this feature a plasma having an enhanced intensity is generated even in a portion where otherwise the microwave plasma intensity may be low and reaction product may easily adhere to.
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