发明申请
- 专利标题: Development processing device
- 专利标题(中): 开发处理装置
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申请号: US12007268申请日: 2008-01-08
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公开(公告)号: US20080176172A1公开(公告)日: 2008-07-24
- 发明人: Hideo Funakoshi , Masahito Hamada , Yoshiki Okamoto
- 申请人: Hideo Funakoshi , Masahito Hamada , Yoshiki Okamoto
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 优先权: JP2007-010694(P) 20070119
- 主分类号: G03F7/30
- IPC分类号: G03F7/30 ; H01L21/027 ; B05C5/00
摘要:
A device includes a rotary base; an approach stage; a substrate holding table and a nozzle head. The substrate holding table holds the work by suction, and comes into intimate contact with the approach stage and the rotary base through first and second annular seal members to form a liquid storage space, respectively. When the suction holding and the intimate contact are released, the substrate becomes rotatable together with the rotary base and the approach stage.
公开/授权文献
- US07819594B2 Development processing device 公开/授权日:2010-10-26
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