发明申请
US20080197021A1 Method to make superior soft (low Hk), high moment magnetic film and its application in writer heads
审中-公开
制造优质软(低Hk),高力矩磁膜及其在写入头中的应用的方法
- 专利标题: Method to make superior soft (low Hk), high moment magnetic film and its application in writer heads
- 专利标题(中): 制造优质软(低Hk),高力矩磁膜及其在写入头中的应用的方法
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申请号: US11707826申请日: 2007-02-16
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公开(公告)号: US20080197021A1公开(公告)日: 2008-08-21
- 发明人: Xiaomin Liu , Cherng-Chyi Han , Feiyue Li
- 申请人: Xiaomin Liu , Cherng-Chyi Han , Feiyue Li
- 专利权人: Headway Technologies, Inc.
- 当前专利权人: Headway Technologies, Inc.
- 主分类号: C25D5/50
- IPC分类号: C25D5/50
摘要:
A process sequence for forming a soft magnetic layer having Hce and Hch of ≦2 Oe, Hk≦5 Oe, and Bs of ≧24 kG is disclosed. A CoFe or CoFe alloy is electroplated in a 10O C to 25O C. bath (pH 2 to 3) containing Co+2 and Fe+2 ions in addition to boric acid and one or more aryl sulfinate salts to promote magnetic softness in the deposited layer. Peak current density is 30 to 60 mA/cm2. A two step magnetic anneal process is performed to further improve softness. An easy axis anneal is followed by a hard axis anneal or vice versa. In an embodiment where the magnetic layer is a pole layer in a write head, the temperature is maintained in a 180O C to 250O C range and the applied magnetic field is kept a 300 Oe or below to prevent degradation of an adjacent read head.
公开/授权文献
- US1683363A Gaiter for use on suspension springs 公开/授权日:1928-09-04
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