发明申请
- 专利标题： MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD FOR PRODUCING MICROSTRUCTURED COMPONENTS
- 专利标题（中）： 微结构投影曝光装置及其生产微结构元件的方法
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申请号： US12054991申请日： 2008-03-25
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公开(公告)号： US20080204692A1公开(公告)日： 2008-08-28
- 发明人: Toralf Gruner , Bernd Geh
- 申请人： Toralf Gruner , Bernd Geh
- 申请人地址： DE Oberkochen
- 专利权人： CARL ZEISS SMT AG
- 当前专利权人： CARL ZEISS SMT AG
- 当前专利权人地址： DE Oberkochen
- 优先权： DE102005053651.4 20051110
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03B27/54
摘要：
A method for producing microstructured components in a microlithographic projection exposure apparatus is disclosed. The method includes imaging a pattern of structures into an image plane of a projection objective. The dose distribution of projection light in the image plane can be influenced so that the image of a structure is at least essentially independent of the topography of structures which lie inside a region surrounding the structure.
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