公开(公告)号：US20080212060A1

公开(公告)日：2008-09-04

申请号：US12065451

申请日：2006-09-02

申请人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

发明人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/54

CPC分类号： G03F7/70666 ,  G03F7/70308

摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method consists in includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.

摘要翻译： 一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。 还描述了用于执行该方法和仿真装置的装置。 由于考虑到系统变迹，本发明使得可以提高再现质量。 本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的幅度分布来计算校正的变迹图像。

公开(公告)号：US07961297B2

公开(公告)日：2011-06-14

申请号：US12065451

申请日：2006-09-02

申请人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

发明人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/72 ,  G03B27/32 ,  G03B27/68 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70666 ,  G03F7/70308

摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.

摘要翻译： 一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。 还描述了用于执行该方法和仿真装置的装置。 由于考虑到系统变迹，本发明使得可以提高再现质量。 本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的振幅分布计算校正的变迹图像。

公开(公告)号：US20080204692A1

公开(公告)日：2008-08-28

申请号：US12054991

申请日：2008-03-25

申请人： Toralf Gruner ,  Bernd Geh

发明人： Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70441 ,  G03F7/70083 ,  G03F7/70141 ,  G03F7/70391 ,  G03F7/70566 ,  G03F7/70941

摘要： A method for producing microstructured components in a microlithographic projection exposure apparatus is disclosed. The method includes imaging a pattern of structures into an image plane of a projection objective. The dose distribution of projection light in the image plane can be influenced so that the image of a structure is at least essentially independent of the topography of structures which lie inside a region surrounding the structure.

摘要翻译： 公开了一种在微光刻投影曝光装置中制造微结构元件的方法。 该方法包括将结构图案成像到投影物镜的像平面中。 可以影响投影光在图像平面中的剂量分布，使得结构的图像至少基本上独立于位于围绕结构的区域内的结构的形貌。

公开(公告)号：US09217932B2

公开(公告)日：2015-12-22

申请号：US13537892

申请日：2012-06-29

申请人： Bernd Geh

发明人： Bernd Geh

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/702 ,  G03F7/703 ,  G03F7/70783

摘要： A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which are arranged along an optical axis of the projection objective and are configured so that a defined image field curvature of the projection objective is set such that an object surface that is curved convexly with respect to the projection objective is imaged into a planar image surface. Such projection objective, with a suitable setting of the object surface curvature, avoids the disturbing effect on the image quality that would otherwise result from gravitation-dictated bending of a mask.

摘要翻译： 用于将布置在投影物镜的物体表面中的图案成像成具有缩小的成像刻度的投影物镜的图像表面的投影物镜具有沿着投影物镜的光轴布置的多个光学元件， 设置投影物镜的定义的图像场曲率，使得相对于投影物镜凸出弯曲的物体表面被成像为平面图像表面。 具有对象表面曲率的适当设置的这种投影物镜避免了由于掩模的重力指定弯曲而导致的图像质量的干扰效应。

公开(公告)号：US08120748B2

公开(公告)日：2012-02-21

申请号：US11709188

申请日：2007-02-22

申请人： Bernd Geh ,  Roger Irwin ,  Eric Anthony Janda ,  David Merritt Phillips

发明人： Bernd Geh ,  Roger Irwin ,  Eric Anthony Janda ,  David Merritt Phillips

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/44 ,  G03B27/32

CPC分类号： G03F7/70625 ,  G03F7/70425

摘要： A method of optimizing lithographic processing to achieve substrate uniformity, is presented herein. In one embodiment, The method includes deriving hyper-sampled correlation information indicative of photoresist behavior for a plurality of wafer substrates processed at pre-specified target processing conditions. The derivation includes micro-exposing subfields of the substrates with a pattern, processing the substrates at the various target conditions, determining photoresist-related characteristics of the subfields (e.g., Bossung curvatures), and extracting correlation information regarding the subfield characteristics and the different target processing conditions to relate the target conditions as a function of subfield characteristics. The method then detects non-uniformities in a micro-exposed subsequent substrate processed under production-level processing conditions and exploits the correlation information to adjust the production-level conditions and achieve uniformity across the substrate.

摘要翻译： 本文给出了优化平版印刷加工以实现基板均匀性的方法。 在一个实施例中，该方法包括导出指示在预定目标处理条件下处理的多个晶片衬底的光致抗蚀剂行为的超采样相关信息。 该衍生包括具有图案的基板的微曝光子场，在各种目标条件下处理基板，确定子场的光致抗蚀剂相关特性（例如，Bossung曲率），以及提取关于子场特性和不同目标的相关信息 处理条件将目标条件作为子场特征的函数进行关联。 然后，该方法检测在生产级处理条件下处理的微暴露的随后的衬底中的不均匀性，并利用相关信息来调整生产水平条件并实现衬底上的均匀性。

公开(公告)号：US07818151B2

公开(公告)日：2010-10-19

申请号：US11415423

申请日：2006-05-02

申请人： Tamer Coskun ,  Sangbong Park ,  Jang Fung Chen ,  Bernd Geh

发明人： Tamer Coskun ,  Sangbong Park ,  Jang Fung Chen ,  Bernd Geh

IPC分类号： G06F17/50

CPC分类号： G03F7/70941 ,  G03F7/705

摘要： A process of obtaining short-range flare model parameters representing a short-range flare which degrades a contrast of an image generated by a lithography tool, is disclosed. Short-range flare is measured from the image to obtain measured short-range flare data. A simulation is performed based on short-range flare model parameters to obtain simulated short-range flare data. The simulated short-range flare data is compared with the measured short range flare data. It is determined whether the short-range flare model parameters used in the simulation is appropriate based on the comparison result. The short-range flare model parameters is optimized according to the measured short-range data and the simulated short-range flare data if the short-range flare model parameters used for the simulation is not appropriate.

摘要翻译： 公开了一种获得表示短距离火炬的短距离火炬模型参数的过程，其降低了由光刻工具产生的图像的对比度。 从图像中测量短程光晕，以获得测量的短距离闪光数据。 基于短距离火炬模型参数进行模拟，以获得模拟的短距离火炬数据。 将模拟的短程火炬数据与测量的短距离火炬数据进行比较。 根据比较结果确定模拟中使用的短程火炬模型参数是否合适。 如果用于模拟的短距离火炬模型参数不合适，则根据测得的短距离数据和模拟的短距离火炬数据优化短距离火炬模型参数。

公开(公告)号：US20070260437A1

公开(公告)日：2007-11-08

申请号：US11415423

申请日：2006-05-02

申请人： Tamer Coskun ,  Sangbong Park ,  Jang Chen ,  Bernd Geh

发明人： Tamer Coskun ,  Sangbong Park ,  Jang Chen ,  Bernd Geh

IPC分类号： G06G7/48

CPC分类号： G03F7/70941 ,  G03F7/705

摘要： A process of obtaining short-range flare model parameters representing a short-range flare which degrades a contrast of an image generated by a lithography tool, is disclosed. Short-range flare is measured from the image to obtain measured short-range flare data. A simulation is performed based on short-range flare model parameters to obtain simulated short-range flare data. The simulated short-range flare data is compared with the measured short range flare data. It is determined whether the short-range flare model parameters used in the simulation is appropriate based on the comparison result. The short-range flare model parameters is optimized according to the measured short-range data and the simulated short-range flare data if the short-range flare model parameters used for the simulation is not appropriate.

摘要翻译： 公开了一种获得表示短距离火炬的短距离火炬模型参数的过程，其降低了由光刻工具产生的图像的对比度。 从图像中测量短程光晕，以获得测量的短距离闪光数据。 基于短距离火炬模型参数进行模拟，以获得模拟的短距离火炬数据。 将模拟的短程火炬数据与测量的短距离火炬数据进行比较。 根据比较结果确定模拟中使用的短程火炬模型参数是否合适。 如果用于模拟的短距离火炬模型参数不合适，则根据测得的短距离数据和模拟的短距离火炬数据优化短距离火炬模型参数。

公开(公告)号：US20060164621A1

公开(公告)日：2006-07-27

申请号：US11041873

申请日：2005-01-25

申请人： Michael Totzeck ,  Bernd Geh ,  Skip Miller

发明人： Michael Totzeck ,  Bernd Geh ,  Skip Miller

IPC分类号： G03B27/72

CPC分类号： G03F7/70966 ,  G03F7/70566

摘要： A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a radially varying birefringence.

摘要翻译： 光刻设备包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化;衬底台，其被配置为保持衬底;以及投影系统，被配置为将所述光束作为图案投影到 基板的目标部分。 光刻设备还包括设置在光束的路径中的偏振修正器。 偏振调节剂包括具有径向变化的双折射的材料。

公开(公告)号：US06934011B2

公开(公告)日：2005-08-23

申请号：US10697811

申请日：2003-10-30

申请人： Bernd Geh ,  Paul Gräupner ,  Thomas Stammler ,  Dirk Stenkamp ,  Jochen Stühler ,  Klaus Wurmbrand

发明人： Bernd Geh ,  Paul Gräupner ,  Thomas Stammler ,  Dirk Stenkamp ,  Jochen Stühler ,  Klaus Wurmbrand

IPC分类号： G02B7/02 ,  G01B11/00 ,  G02B13/00 ,  G02B27/00 ,  G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  G03B27/32

CPC分类号： G03F7/706 ,  G01M11/0207 ,  G01M11/0242 ,  G01M11/0257 ,  G02B27/0012 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70666

摘要： In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.

公开(公告)号：US20050106479A1

公开(公告)日：2005-05-19

申请号：US10715109

申请日：2003-11-18

申请人： Bernd Geh ,  Roger Irwin ,  Eric Janda ,  David Phillips

发明人： Bernd Geh ,  Roger Irwin ,  Eric Janda ,  David Phillips

IPC分类号： H01L21/027 ,  G03F7/00 ,  G03F7/20

CPC分类号： G03F7/70625 ,  G03F7/70425

摘要： A method of optimizing lithographic processing to achieve substrate uniformity, is presented herein. In one embodiment, The method includes deriving hyper-sampled correlation information indicative of photoresist behavior for a plurality of wafer substrates processed at pre-specified target processing conditions. The derivation includes micro-exposing subfields of the substrates with a pattern, processing the substrates at the various target conditions, determining photoresist-related characteristics of the subfields (e.g., Bossung curvatures), and extracting correlation information regarding the subfield characteristics and the different target processing conditions to relate the target conditions as a function of subfield characteristics. The method then detects non-uniformities in a micro-exposed subsequent substrate-processed under production-level processing conditions and exploits the correlation information to adjust the production-level conditions and achieve uniformity across the substrate.

摘要翻译： 本文给出了优化平版印刷加工以实现基板均匀性的方法。 在一个实施例中，该方法包括导出指示在预定目标处理条件下处理的多个晶片衬底的光致抗蚀剂行为的超采样相关信息。 衍生包括具有图案的基板的微曝光子场，在各种目标条件下处理基板，确定子场的光致抗蚀剂相关特性（例如，Bossung曲率），以及提取关于子场特性和不同目标的相关信息 处理条件将目标条件作为子场特征的函数进行关联。 然后，该方法在生产级处理条件下的微曝光后续衬底处理中检测不均匀性，并利用相关信息来调整生产水平条件并实现衬底上的均匀性。