发明申请
- 专利标题： Material For The Treatment Of Lithographic Substrates And Lithographic Printing Plates
- 专利标题（中）： 用于光刻基板和平版印刷板的处理材料
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申请号： US11813678申请日： 2006-01-12
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公开(公告)号： US20080206666A1公开(公告)日： 2008-08-28
- 发明人: Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
- 申请人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
- 优先权： DE102005002754.7 20050120
- 国际申请： PCT/EP06/00239 WO 20060112
- 主分类号： B32B13/04
- IPC分类号： B32B13/04 ; G03F7/004
摘要：
Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
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