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    Developer for alkaline-developable lithographic printing plates
    2.
    发明授权
    Developer for alkaline-developable lithographic printing plates 失效

    公开(公告)号：US06541188B2

    公开(公告)日：2003-04-01

    申请号：US09853358

    申请日：2001-05-11

    申请人： Ulrich Fiebag ,  Hans-Joachim Timpe ,  Uwe Tondock ,  Andreas Vihs

    发明人： Ulrich Fiebag ,  Hans-Joachim Timpe ,  Uwe Tondock ,  Andreas Vihs

    IPC分类号： G03F732

    CPC分类号： G03F7/322

    摘要： An aqueous alkaline developing system for alkaline-developable lithographic printing plates and a method for its use are disclosed. The developing system comprises one or more water-soluble suppressors of the following structure: R1 (CHOH)nR2 in which: n is 4 to 7; and either (i) R1 is hydrogen, aryl, or CH2OH; and R2 is alkyl group having 1 to 4 carbon atoms, CH2OR3 in which R3 is an alkyl group having 1 to 4 carbon atoms, CH2N(R4R5) in which R4 and R5 are each independently hydrogen or an alkyl group having 1 to 4 carbon atoms, or CO2H; or (ii) R1 and R2 together form a carbon-carbon single bond. The developing system is especially suited for developing imageable elements useful as lithographic printing plates. The developing system is especially suited for use with elements in which (1) the imageable layer comprises at least one phenolic resin or at least one polymeric compound having pendent sulfonamide groups, and (2) the substrate is aluminum or and an aluminum alloy.

    Process for Production of Lithographic Printing Plates
    5.
    发明申请
    Process for Production of Lithographic Printing Plates 审中-公开

    公开(公告)号：US20080145790A1

    公开(公告)日：2008-06-19

    申请号：US11815578

    申请日：2006-02-01

    申请人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    发明人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    IPC分类号： G03F7/12

    CPC分类号： G03F7/322

    摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt.-% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from —CH═CH—, —C≡C—, formula (II), formula (III), and formula (IV), n+m results in a value of 2 to 30 and p+q results in a value of 0 to 30, wherein in the case of p+q≠0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.

    Method for Making a Lithographic Plate
    6.
    发明申请
    Method for Making a Lithographic Plate 失效
    制作平版印刷版的方法

    公开(公告)号：US20070254238A1

    公开(公告)日：2007-11-01

    申请号：US11573916

    申请日：2005-08-23

    申请人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhradt ,  Detlef Pietsch

    发明人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhradt ,  Detlef Pietsch

    IPC分类号： G03C1/00

    CPC分类号： B41N3/08

    摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs

    摘要翻译： 一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个具有pK <5的酸性官能团的单体，其中酸性 官能团可以作为游离酸基团或以盐的形式存在; （c）干燥。

    Additive correction fluid for metal printing forms
    7.
    发明授权
    Additive correction fluid for metal printing forms 失效
    用于金属印刷形式的添加剂修正液

    公开(公告)号：US06517622B1

    公开(公告)日：2003-02-11

    申请号：US09655241

    申请日：2000-09-05

    申请人： Ulrich Fiebag ,  Uwe Tondock

    发明人： Ulrich Fiebag ,  Uwe Tondock

    IPC分类号： C09D1000

    CPC分类号： B41N3/08

    摘要： A composition for positive correction of lithographic printing plates, applicable by pen or by brush, is disclosed. The correction fluid contains a film forming phosphate ester and a solvent that does not dissolve image areas of the printing plate. A correction kit containing the composition and methods for correcting printing plates by additive correction are also disclosed.

    摘要翻译： 公开了一种用于钢笔或刷子适用的平版印刷版的正面校正组合物。 修正液含有成膜磷酸酯和不溶解印刷版图像区域的溶剂。 还公开了一种包含通过加法校正校正印版的组合物和方法的校正工具。

    METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATES
    8.
    发明申请
    METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATES 审中-公开
    制备平版印刷板的方法

    公开(公告)号：US20080113298A1

    公开(公告)日：2008-05-15

    申请号：US11559932

    申请日：2006-11-15

    申请人： Harald Baumann ,  Ulrich Fiebag ,  Jianbing Huang

    发明人： Harald Baumann ,  Ulrich Fiebag ,  Jianbing Huang

    IPC分类号： G03F7/004

    CPC分类号： G03F7/322

    摘要： A defoamer solution is introduced into a pre-rinsing solution, developer, or post-rinsing solution in a lithographic processing apparatus in relation to the surface area of processed imageable element. Surfactants can then be used in the developer if desired, and the recirculation rates of various solutions can be reduced.

    摘要翻译： 将消泡剂溶液相对于加工的可成像元件的表面积引入光刻处理设备中的预漂洗溶液，显影剂或漂洗后溶液。 如果需要，表面活性剂然后可用于显影剂中，并且可以降低各种溶液的再循环速率。

    Method of processing lithographic printing plate precursors
    10.
    发明授权
    Method of processing lithographic printing plate precursors 失效
    平版印刷版前体的处理方法

    公开(公告)号：US06649319B2

    公开(公告)日：2003-11-18

    申请号：US09878457

    申请日：2001-06-11

    申请人： Ulrich Fiebag ,  Hans-Joachim Timpe ,  Uwe Todock ,  Anfreas Vihs

    发明人： Ulrich Fiebag ,  Hans-Joachim Timpe ,  Uwe Todock ,  Anfreas Vihs

    IPC分类号： G03F7021

    CPC分类号： G03F7/322 ,  B41N3/08

    摘要： A method of processing imageable elements useful as alkaline-developable lithographic printing plate precursors that does not require either a rinsing step or a further gumming step is disclosed. The method comprises simultaneously developing and gumming the imaged element with an aqueous alkaline developing-gumming solution comprising one or more water-soluble polyhydroxy compounds of the following structure: R1(CHOH)nR2 in which n is 4 to 7; and either (i) R1 is hydrogen, aryl, or CH2OH; and R2 is hydrogen, alkyl group having 1 to 4 carbon atoms, CH2OR3 in which R3 is hydrogen or an alkyl group having 1 to 4 carbon atoms, CH2N(R4R5) in which R4 and R5 are each independently hydrogen or an alkyl group having 1 to 4 carbon atoms, or CO2H, or (ii) R1 and R2 together form a carbon—carbon single bond.

    摘要翻译： 公开了一种可用作碱性显影平版印刷版前体的可成像元件的方法，该前体不需要漂洗步骤或进一步的上胶步骤。 该方法包括用包含一种或多种以下结构的水溶性多羟基化合物的含水碱性显影胶溶液同时显影和涂胶成像元件：其中n为4至7; 并且（i）R 1是氢，芳基或CH 2 OH; 和R 2是氢，具有1至4个碳原子的烷基，CH 2 OR 3，其中R 3是氢或具有1至4个碳原子的烷基，CH 2 N（R 4 R 5） R 4和R 5各自独立地为氢或具有1至4个碳原子的烷基或CO 2 H，或（ii）R 1和R 2一起形成碳 - 碳单键。