Invention Application
- Patent Title: Bipolar Resistive Memory Device Having Tunneling Layer
- Patent Title (中): 具有隧道层的双极电阻存储器件
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Application No.: US12037400Application Date: 2008-02-26
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Publication No.: US20080211036A1Publication Date: 2008-09-04
- Inventor: Jin Shi Zhao , Jang-eun Lee , In-gyu Baek , Se-chung Oh , Kyung-tae Nam , Eun-kyung Yim
- Applicant: Jin Shi Zhao , Jang-eun Lee , In-gyu Baek , Se-chung Oh , Kyung-tae Nam , Eun-kyung Yim
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Priority: KR2007-21170 20070302
- Main IPC: H01L29/8605
- IPC: H01L29/8605 ; H01C1/012

Abstract:
A nonvolatile memory device includes a semiconductor substrate, a first electrode on the semiconductor substrate, a resistive layer on the first electrode, a second electrode on the resistive layer and at least one tunneling layer interposed between the resistive layer and the first electrode and/or the second electrode. The resistive layer and the tunneling layer may support transition between first and second resistance states responsive to first and second voltages applied across the first and second electrodes. The first and second voltages may have opposite polarities.
Information query
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