发明申请
- 专利标题: FOCUSING METHOD OF CHARGED PARTICLE BEAM AND ASTIGMATISM ADJUSTING METHOD OF CHARGED PARTICLE
- 专利标题(中): 充电颗粒聚焦方法及其补充方法
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申请号: US12043707申请日: 2008-03-06
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公开(公告)号: US20080217553A1公开(公告)日: 2008-09-11
- 发明人: Kenji Ohtoshi , Hitoshi Sunaoshi , Osamu Iizuka , Takahito Nakayama
- 申请人: Kenji Ohtoshi , Hitoshi Sunaoshi , Osamu Iizuka , Takahito Nakayama
- 申请人地址: JP Numazu-shi
- 专利权人: NuFlare Technology, Inc.
- 当前专利权人: NuFlare Technology, Inc.
- 当前专利权人地址: JP Numazu-shi
- 优先权: JP2007-057900 20070307
- 主分类号: H01J3/14
- IPC分类号: H01J3/14
摘要:
A focusing method of a charged particle beam includes measuring a first set value to focus a beam on a position of a reference plane by using a lens coil, acquiring a first factor to change a set value of an electrostatic lens depending on a distance and a second factor to change a set value of the coil depending on a distance, measuring a level distribution of a target plane, correcting the first set value by using the second factor to correct a focal point position of the beam in the coil from the position of the reference plane to an intermediate level position of the level distribution of the target plane, and correcting a second set value of the lens depending on a level position of the target plane by using the first factor to correct a focal point position of the beam by the lens.